At LUT, login to RefWorks via https://refworks.proquest.com/
First time users create an account via the link at the bottom of the login window. Your username is your LUT email address and your password is one that you create yourself.
In RefWorks, there are tailored citation Harvard styles for LUT. For authors who write in Finnish, there is LUT Harvard tyyli. Alternatively, authors who write in English can choose between two LUT Harvard styles. LUT Harvard style (without any extension) uses 'and' between two authors or before the last author. However, if the author prefers the & sign instead of the word 'and', he/she can choose LUT Harvard style &.
LUT Harvard style:
Subramanian V, Youtie J, Porter AL and Shapira P (2010) Is there a shift to “active nanostructures”? Journal of Nanoparticle Research 12: 1-10.
LUT Harvard style &:
Subramanian V, Youtie J, Porter AL & Shapira P (2010) Is there a shift to “active nanostructures”? Journal of Nanoparticle Research 12: 1-10.